It is becoming more and more difficult in nanometer designs to reliably print the image intended by the designer. This task is demanding enough under normal conditions; maintaining pattern fidelity ...
Matsushita Electric Industrial Co. Ltd. said it is using Mentor Graphics Corp.’s Calibre OPCverify design-for-manufacturing (DFM) software for use in production at 65nm and below to examine the impact ...
To ensure success in semiconductor technology development, process engineers must set the allowed ranges for wafer process parameters. Variability must be controlled, so that final fabricated devices ...
Virtual fabrication is used to evaluate the performance of interconnects (line and via resistance, capacitance, etc.) across pitches compatible with either EUV single exposure or SADP for three ...
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