To ensure success in semiconductor technology development, process engineers must set the allowed ranges for wafer process parameters. Variability must be controlled, so that final fabricated devices ...
Matsushita Electric Industrial Co. Ltd. said it is using Mentor Graphics Corp.’s Calibre OPCverify design-for-manufacturing (DFM) software for use in production at 65nm and below to examine the impact ...
Increasingly tight tolerances and rigorous demands for quality are forcing chipmakers and equipment manufacturers to ferret out minor process variances, which can create significant anomalies in ...
San Jose, Calif. – June 23, 2009 – Solido Design Automation, a leading developer of software for eliminating design loss caused by process variation in analog/mixed-signal and custom integrated ...
Special cause variation, I love to see it! That’s because I know I’m about to learn something important about my process. A ...
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