Gearing up for next week’s Semicon West tradeshow in San Francisco and San Jose,Applied Materials Inc. today rolled out its Silicon Etch Hart chamber for etching highaspect ration trenches to form ...
To allow real-time control of dielectric chemical mechanical planarization (CMP) processes to the 45 nm device node and beyond, Santa Clara, Calif.-based semiconductor manufacturing equipment leader ...
SANTA CLARA, Calif.--(BUSINESS WIRE)--Applied Materials, Inc. today announced the shipment of its 2,500 th CMP 1 system, marking a major milestone in the industry and ten consecutive years of CMP ...
A fundamental component of modern electronic goods is the semiconductor. More powerful, faster and smaller processors are in constant demand for many services and goods because of the advent of the ...
Chemical mechanical polishing (CMP) – also known as planarization – has long been the most commonly employed technique for smoothing and flattening wafer surfaces during the fabrication of ...
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