Abstract: Continuum robots (CRs) show great potential in complex environments due to their excellent deformability. For practical applications, the position control of the CRs is an important research ...
Elimination of Pinhole Defects in Self-Aligned Double Patterning Process by using Bias Pulsed Plasma
Abstract: Self-aligned double patterning (SADP) is extensively utilized in advanced sub-20nm technology nodes. The DRAM digit contact SADP dry etch process experienced severe yield loss due to pinhole ...
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